2026-03-11T07:00:03Z https://kait.repo.nii.ac.jp/oai

oai:kait.repo.nii.ac.jp:00000909 2025-06-11T05:22:17Z 2:16:41:115

Spatial Distribution of Cu Atoms Sputtered from Copper Target in RF Magnetron Sputtering 万代, 敏夫 Bandai, Toshio sputter deposition thin films quartz-crystal deposition monitor mean free path application/pdf The spatial distribution of Cu atoms sputtered from a copper target in an RF magnetron sputtering was measured by the use of a quartz-crystal deposition monitor. At Argon pressure of 20 Pa, the angular distribution of sputtered atoms had a cosine-like distribution. At the lower Argon pressure, however, the deposition rate decreased at the front the target. This decrease was due to energetic neutral Ar atoms which bombarded and evaporated the growing films at the front of the target. The spatial distribution of Cu atoms sputtered from the target was simulated using the Monte Carlo method and compared with the observed result. 神奈川工科大学 2001-03-20 eng departmental bulletin paper VoR https://doi.org/10.34411/00000902 http://hdl.handle.net/10368/887 https://kait.repo.nii.ac.jp/records/909 10.34411/00000902 AN10074179 09161902 神奈川工科大学研究報告.B,理工学編 25 131 136 https://kait.repo.nii.ac.jp/record/909/files/kkb-025-021.pdf application/pdf 2.4 MB 2010-02-03