{"created":"2023-05-15T12:25:43.895494+00:00","id":1046,"links":{},"metadata":{"_buckets":{"deposit":"2efb2840-b027-48f0-9855-ae8a70a905e0"},"_deposit":{"created_by":4,"id":"1046","owners":[4],"pid":{"revision_id":0,"type":"depid","value":"1046"},"status":"published"},"_oai":{"id":"oai:kait.repo.nii.ac.jp:00001046","sets":["2:16:42:123"]},"author_link":[],"item_10002_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2009-03-20","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"46","bibliographicPageStart":"43","bibliographicVolumeNumber":"33","bibliographic_titles":[{"bibliographic_title":"神奈川工科大学研究報告.B,理工学編"}]}]},"item_10002_description_19":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_10002_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"MgO thin films have been deposited on quartz glass substrates by RF magnetron sputtering using a MgO target in Ar/O2 mixture gas. The films were evaluated using scanning electron microscope (SEM) and energy dispersive X-ray spectroscopy (EDX). The columnar structure of cross sections for MgO films deposited by the sputtering gas of Ar/O2 mixture becomes clearly with O2 percentage increase. The breakdown voltages for electrodes of MgO films were measured under various Ne pressures by the V-Q Lissajous method. The breakdown voltages for MgO films deposited in Ar/O2 mixture decreases with O2 percentage increase.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10002_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.34411/00001039","subitem_identifier_reg_type":"JaLC"}]},"item_10002_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"神奈川工科大学"}]},"item_10002_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AN10074179","subitem_source_identifier_type":"NCID"}]},"item_10002_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"09161902","subitem_source_identifier_type":"PISSN"}]},"item_10002_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"三栖, 貴行","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"杉本, 真教","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"浪江, 正宗","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"後藤, みき","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"荒井, 俊彦","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"Misu, Takayuki","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Sugimoto, Masanori","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Namie, Masamune","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Goto, Miki","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Arai, Toshihiko","creatorNameLang":"en"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2012-02-28"}],"displaytype":"detail","filename":"kkb-033-009.pdf","filesize":[{"value":"1.4 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"kkb-033-009.pdf","objectType":"fulltext","url":"https://kait.repo.nii.ac.jp/record/1046/files/kkb-033-009.pdf"},"version_id":"bd6b763e-5e2d-4f51-80f3-ff033905ff67"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"MgO thin films","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"sputtering","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Breakdown voltage","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Cold cathode","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"LCD backlighting","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"スパッタ法によるMgO薄膜の作製と放電特性","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"スパッタ法によるMgO薄膜の作製と放電特性","subitem_title_language":"ja"},{"subitem_title":"Fabrication of MgO thin films deposited by sputtering and their discharge properties","subitem_title_language":"en"}]},"item_type_id":"10002","owner":"4","path":["123"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2020-11-24"},"publish_date":"2020-11-24","publish_status":"0","recid":"1046","relation_version_is_last":true,"title":["スパッタ法によるMgO薄膜の作製と放電特性"],"weko_creator_id":"4","weko_shared_id":-1},"updated":"2023-08-04T09:18:05.804254+00:00"}