{"created":"2023-05-15T12:25:32.894448+00:00","id":844,"links":{},"metadata":{"_buckets":{"deposit":"7ced04f0-054d-4d23-a6d2-1842694bd363"},"_deposit":{"created_by":4,"id":"844","owners":[4],"pid":{"revision_id":0,"type":"depid","value":"844"},"status":"published"},"_oai":{"id":"oai:kait.repo.nii.ac.jp:00000844","sets":["2:16:41:113"]},"author_link":[],"item_10002_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1999-03-20","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"72","bibliographicPageStart":"69","bibliographicVolumeNumber":"23","bibliographic_titles":[{"bibliographic_title":"神奈川工科大学研究報告.B,理工学編"}]}]},"item_10002_description_19":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_10002_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Neutral CF3 and CF2 radicals in a hollow cathode de CF4 discharge have been first measured under various discharge currents and CF4 pressures with a quadrupole mass spectrometer, using the threshold ionization technique. It has been found that the CF 3 and CF2 radical densities were higher than that obtained for other types of discharges.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10002_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.34411/00000837","subitem_identifier_reg_type":"JaLC"}]},"item_10002_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"神奈川工科大学"}]},"item_10002_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AN10074179","subitem_source_identifier_type":"NCID"}]},"item_10002_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"09161902","subitem_source_identifier_type":"PISSN"}]},"item_10002_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"藤岡, 寛之","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"真篠, 聡一","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"愛敬, 仁","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"後藤, みき","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"荒井, 俊彦","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"Fujioka, Hiroyuki","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Mashino, Souichi","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Aikyo, Satoshi","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Goto, Miki","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Arai, Toshihiko","creatorNameLang":"en"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2010-02-03"}],"displaytype":"detail","filename":"kkb-023-011.pdf","filesize":[{"value":"1.5 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"kkb-023-011.pdf","objectType":"fulltext","url":"https://kait.repo.nii.ac.jp/record/844/files/kkb-023-011.pdf"},"version_id":"2f077b6e-4779-4ccb-9bf1-90b0352c6a44"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Etching plasma","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Hollow cathode discharge","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"CF4 plasma","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"CF3 radical","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"CF2 radical","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Mass spectrometry","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"ホローカソードCF4プラズマ中のCF3,CF2ラジカル測定","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"ホローカソードCF4プラズマ中のCF3,CF2ラジカル測定","subitem_title_language":"ja"},{"subitem_title":"Measurement of CF3 and CF2 Radicals in a Hollow Cathode CF4 Plasma","subitem_title_language":"en"}]},"item_type_id":"10002","owner":"4","path":["113"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2020-11-24"},"publish_date":"2020-11-24","publish_status":"0","recid":"844","relation_version_is_last":true,"title":["ホローカソードCF4プラズマ中のCF3,CF2ラジカル測定"],"weko_creator_id":"4","weko_shared_id":-1},"updated":"2023-08-04T09:00:21.091920+00:00"}