{"created":"2023-05-15T12:25:33.444418+00:00","id":856,"links":{},"metadata":{"_buckets":{"deposit":"b2a00911-b37a-4c63-ad97-31a3a11f9317"},"_deposit":{"created_by":4,"id":"856","owners":[4],"pid":{"revision_id":0,"type":"depid","value":"856"},"status":"published"},"_oai":{"id":"oai:kait.repo.nii.ac.jp:00000856","sets":["2:16:41:113"]},"author_link":[],"item_10002_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1999-03-20","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"38","bibliographicPageStart":"33","bibliographicVolumeNumber":"23","bibliographic_titles":[{"bibliographic_title":"神奈川工科大学研究報告.B,理工学編"}]}]},"item_10002_description_19":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_10002_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Theoretical analysis on relationship between pulse photoconductivity amplitude (PPCA), surface recombination velocity (S0) and back surface recombination velocity (Sw) shows that PPCA is dependent on S0 but not dependent on Sw>3000cm/s. PPCA and microroughness measured for polishing pressure in a CMP process reveal the minimum of surface microroughness Rrms at 65g/cm2 and behavior of subsurface damages. PPCA was reconfirmed to well reflect to subsurface damage from the agreement with initial carrier lifetime measured with UV/mm-wave technique.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10002_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.34411/00000849","subitem_identifier_reg_type":"JaLC"}]},"item_10002_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"神奈川工科大学"}]},"item_10002_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AN10074179","subitem_source_identifier_type":"NCID"}]},"item_10002_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"09161902","subitem_source_identifier_type":"PISSN"}]},"item_10002_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"黒川, 昌毅","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"荻田, 陽一郎","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"Kurokawa, Masaki","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Ogita, Yo-ichiro","creatorNameLang":"en"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2010-02-03"}],"displaytype":"detail","filename":"kkb-023-006.pdf","filesize":[{"value":"2.5 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"kkb-023-006.pdf","objectType":"fulltext","url":"https://kait.repo.nii.ac.jp/record/856/files/kkb-023-006.pdf"},"version_id":"15eac231-a389-4a1c-a3a8-31c939268c87"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"PPCA signal","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Continuity equations","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Subsurface damage","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Photoconductivity","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Chemomechanical polishing","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Si wafer","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"鏡面研磨Siウェーハ表面層のパルス光導電振幅による評価","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"鏡面研磨Siウェーハ表面層のパルス光導電振幅による評価","subitem_title_language":"ja"},{"subitem_title":"Subsurface Characterization of Mirror Polished Si Wafers Using Pulse Photoconductivity Amplitude","subitem_title_language":"en"}]},"item_type_id":"10002","owner":"4","path":["113"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2020-11-24"},"publish_date":"2020-11-24","publish_status":"0","recid":"856","relation_version_is_last":true,"title":["鏡面研磨Siウェーハ表面層のパルス光導電振幅による評価"],"weko_creator_id":"4","weko_shared_id":-1},"updated":"2023-08-04T09:00:47.585909+00:00"}