{"created":"2023-05-15T12:25:36.372422+00:00","id":909,"links":{},"metadata":{"_buckets":{"deposit":"e77ac304-76de-4f18-93a5-974459bd4cf5"},"_deposit":{"created_by":4,"id":"909","owners":[4],"pid":{"revision_id":0,"type":"depid","value":"909"},"status":"published"},"_oai":{"id":"oai:kait.repo.nii.ac.jp:00000909","sets":["2:16:41:115"]},"author_link":[],"item_10002_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2001-03-20","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"136","bibliographicPageStart":"131","bibliographicVolumeNumber":"25","bibliographic_titles":[{"bibliographic_title":"神奈川工科大学研究報告.B,理工学編"}]}]},"item_10002_description_19":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_10002_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"The spatial distribution of Cu atoms sputtered from a copper target in an RF magnetron sputtering was measured by the use of a quartz-crystal deposition monitor. At Argon pressure of 20 Pa, the angular distribution of sputtered atoms had a cosine-like distribution. At the lower Argon pressure, however, the deposition rate decreased at the front the target. This decrease was due to energetic neutral Ar atoms which bombarded and evaporated the growing films at the front of the target. The spatial distribution of Cu atoms sputtered from the target was simulated using the Monte Carlo method and compared with the observed result.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10002_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.34411/00000902","subitem_identifier_reg_type":"JaLC"}]},"item_10002_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"神奈川工科大学"}]},"item_10002_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AN10074179","subitem_source_identifier_type":"NCID"}]},"item_10002_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"09161902","subitem_source_identifier_type":"PISSN"}]},"item_10002_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"万代, 敏夫","creatorNameLang":"ja"}]},{"creatorNames":[{"creatorName":"Bandai, Toshio","creatorNameLang":"en"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2010-02-03"}],"displaytype":"detail","filename":"kkb-025-021.pdf","filesize":[{"value":"2.4 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"kkb-025-021.pdf","objectType":"fulltext","url":"https://kait.repo.nii.ac.jp/record/909/files/kkb-025-021.pdf"},"version_id":"d4ad327d-5216-4c93-9155-27d0fba09dc6"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"sputter deposition","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"thin films","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"quartz-crystal deposition monitor","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"mean free path","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Spatial Distribution of Cu Atoms Sputtered from Copper Target in RF Magnetron Sputtering","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Spatial Distribution of Cu Atoms Sputtered from Copper Target in RF Magnetron Sputtering","subitem_title_language":"en"}]},"item_type_id":"10002","owner":"4","path":["115"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2020-11-24"},"publish_date":"2020-11-24","publish_status":"0","recid":"909","relation_version_is_last":true,"title":["Spatial Distribution of Cu Atoms Sputtered from Copper Target in RF Magnetron Sputtering"],"weko_creator_id":"4","weko_shared_id":-1},"updated":"2023-08-04T09:05:21.834305+00:00"}