{"created":"2023-05-15T12:25:37.938070+00:00","id":937,"links":{},"metadata":{"_buckets":{"deposit":"81de3282-8658-48e2-bfee-74c111d2e3b8"},"_deposit":{"created_by":4,"id":"937","owners":[4],"pid":{"revision_id":0,"type":"depid","value":"937"},"status":"published"},"_oai":{"id":"oai:kait.repo.nii.ac.jp:00000937","sets":["2:16:41:117"]},"author_link":[],"item_10002_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2003-03-20","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"5","bibliographicPageStart":"1","bibliographicVolumeNumber":"27","bibliographic_titles":[{"bibliographic_title":"神奈川工科大学研究報告.B,理工学編"}]}]},"item_10002_description_19":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_10002_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Photoconductivity frequency responses (PCF) method with blue laser photoexcitation has been developed for evaluating surface and subsurface property. Carrier lifetimes obtained from PCF measurements for silicon wafers has revealed to correspond to that determined from surface and subsurface lifetimes,due to comparing with lifetime by Bi-surface photoconductivity decay. PCF photoconductivity amplitude reflected nearbysurface damage induced by H2+ ion implantation. PCF reflected microroughness and subsurface damage induced by chemomechanical polishing.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10002_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.34411/00000930","subitem_identifier_reg_type":"JaLC"}]},"item_10002_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"神奈川工科大学"}]},"item_10002_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AN10074179","subitem_source_identifier_type":"NCID"}]},"item_10002_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"09161902","subitem_source_identifier_type":"PISSN"}]},"item_10002_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"安野, 勇樹","creatorNameLang":"ja"},{"creatorName":"Anno, Yuuki","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"荻田, 陽一郎","creatorNameLang":"ja"},{"creatorName":"Ogita, Yo-ichiro","creatorNameLang":"en"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2010-02-03"}],"displaytype":"detail","filename":"kkb-027-001.pdf","filesize":[{"value":"2.1 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"kkb-027-001.pdf","objectType":"fulltext","url":"https://kait.repo.nii.ac.jp/record/937/files/kkb-027-001.pdf"},"version_id":"b7d6e729-5bc4-4de0-907a-660e90311c83"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Si wafer","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Subsurface carrier lifetime","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Subsurface characterization","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"H2+ ion implantation","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Polishing pressure","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Siウェーハ表面層のマイクロ波光導電周波数応答による評価","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Siウェーハ表面層のマイクロ波光導電周波数応答による評価","subitem_title_language":"ja"},{"subitem_title":"Si Wafer Subsurface Characterization Using Microwave Photoconductivity Frequency Responses","subitem_title_language":"en"}]},"item_type_id":"10002","owner":"4","path":["117"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2020-11-24"},"publish_date":"2020-11-24","publish_status":"0","recid":"937","relation_version_is_last":true,"title":["Siウェーハ表面層のマイクロ波光導電周波数応答による評価"],"weko_creator_id":"4","weko_shared_id":-1},"updated":"2025-06-16T02:34:00.584502+00:00"}